62‐1: High Performance OLED with Microlens Array, Metal Mask‐Less Lithography, and RGB Side‐by‐Side Patterning

Author:

Sugisawa Nozomu1,Nakamura Daiki1,Hatsumi Ryo1,Ikeda Hisao1,Nagata Takaaki1,Aoyama Tomoya1,Eguchi Shingo1,Yamane Yasumasa1,Miyairi Hidekazu1,Ishitani Tetsuji1,Matsuki Mitsuhiro1,Okazaki Kenichi1,Idojiri Satoru2,Nakazawa Yasutaka2,Yamazaki Shunpei1

Affiliation:

1. Semiconductor Energy Laboratory Co. Ltd. Kanagawa Japan

2. Semiconductor Energy Laboratory Co. Ltd. Tochigi Japan

Abstract

This paper reports on a metal mask‐less lithography (MML) process for RGB OLED displays. By integrating MML, tandem OLEDs, and a microlens array (MLA), ultra‐high resolution, high luminance, and robust reliability can be realized. The report also demonstrates an MLA using an S‐stripe MLA pattern. The prototype exhibits excellent properties, with a white light efficiency of 66.7 cd/A at 15,000 cd/m².

Publisher

Wiley

Reference12 articles.

1. S. Yamazaki JP patent 7236518.

2. S. Yamazaki et al. JP patent 7315768.

3. S. Yamazaki et al. US patent 8 344 363 B2.

4. P‐130: 3207‐ppi, 1.50‐in. OLED Microdisplay with All Pixels Formed Through RGB Side‐by‐Side Patterning by Photolithography

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