Affiliation:
1. Semiconductor Energy Laboratory Co. Ltd. Kanagawa Japan
2. Semiconductor Energy Laboratory Co. Ltd. Tochigi Japan
Abstract
This paper reports on a metal mask‐less lithography (MML) process for RGB OLED displays. By integrating MML, tandem OLEDs, and a microlens array (MLA), ultra‐high resolution, high luminance, and robust reliability can be realized. The report also demonstrates an MLA using an S‐stripe MLA pattern. The prototype exhibits excellent properties, with a white light efficiency of 66.7 cd/A at 15,000 cd/m².