Direct Growth of Si, Ge, and Si–Ge Heterostructure Nanowires Using Electroplated Zn: An Inexpensive Seeding Technique for Li‐Ion Alloying Anodes-Reference-Cited by-同舟云学术

Direct Growth of Si, Ge, and Si–Ge Heterostructure Nanowires Using Electroplated Zn: An Inexpensive Seeding Technique for Li‐Ion Alloying Anodes

Published:2021-01-21 Issue:10 Volume:17 Page:2005443
ISSN:1613-6810
Container-title:Small
language:en
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Author:

Kilian Seamus¹^ORCID,McCarthy Kieran¹,Stokes Killian¹,Adegoke Temilade Esther¹,Conroy Michele²,Amiinu Ibrahim Saana¹,Geaney Hugh¹,Kennedy Tadhg¹,Ryan Kevin M.¹

Affiliation:

1. Bernal Institute and Department of Chemical Sciences University of Limerick Limerick V94 T9PX Ireland

2. Bernal Institute and Department of Physics University of Limerick Limerick V94 T9PX Ireland

Funder

Science Foundation Ireland

Irish Research Council

Publisher

Wiley

Subject

Biomaterials,Biotechnology,General Materials Science,General Chemistry

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/smll.202005443

Reference64 articles.

1. High Performance Silicon Nanowire Field Effect Transistors

2. Silicon nanowires for Li-based battery anodes: a review

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4. Vapor-Liquid-Solid Growth of Semiconductor Nanowires

5. Diameter-Dependent Growth Direction of Epitaxial Silicon Nanowires

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