Paper No 19.3: Back-Channel-Etch Process Flow for a-IGZO TFTs-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Paper No 19.3: Back-Channel-Etch Process Flow for a-IGZO TFTs

Published:2013-09 Issue: Volume:44 Page:285-288
ISSN:0097-966X
Container-title:SID Symposium Digest of Technical Papers
language:en
Short-container-title:SID Int Symp Dig Tec

Author:

Nag Manoj¹²,Steudel Soeren¹,Chasin Adrian¹²,Myny Kris¹,Rockele Maarten¹²,Bhoolokam Ajay¹²,Willegems Myriam¹,Smout Steve¹,Vicca Peter¹,Ameys Marc¹,Schols Sarah¹,Cheyns David¹,Genoe Jan¹,van der Steen Jan-Laurens³,Tempelaars Karin³,Groeseneken Guido¹²,Heremans Paul¹²

Affiliation:

1. IMEC; Kapeldreef 75 3001 Leuven Belgium

2. ESAT, Katholieke Universiteit Leuven; Kasteelpark Arenberg 10 3001 Leuven Belgium

3. Holst Centre, High Tech Campus 31; 5656 AE Eindhoven The Netherlands

Publisher

Wiley

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/sdtp.83/fullpdf

Reference10 articles.

1. Room-temperature fabrication of transparent flexible thin-film transistors using amorphous oxide semiconductors;Nomura;Nature,2004

2. Toward high-performance amorphous GIZO TFTs;Barquinha;J. Electrochem. Soc.,2009

3. Amorphous oxide semiconductors for high-performance flexible thin-film transistors;Nomura;Jpn. J. Appl. Phys.,2006

4. High performance indium-zinc-oxide thin-film transistors fabricated with a back-channel-etch-technique;Xu;Appl. Phys. Lett.,2011

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP