Comparative Nanomechanical Study of Multiharmonic Force Microscopy and Nanoindentation on Low Dielectric Constant Materials
Author:
Publisher
John Wiley & Sons, Inc
Link
http://onlinelibrary.wiley.com/wol1/doi/10.1002/9781118723111.ch14/fullpdf
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1. An improved technique for determining hardness and elastic modulus using load and displacement sensing indentation experiments
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3. Porosity and Mechanical Properties of Mesoporous Thin Films Assessed by Environmental Ellipsometric Porosimetry
4. Determination of Young’s Modulus of Porous Low-k Films by Ellipsometric Porosimetry
5. Quantitative measurement of indentation hardness and modulus of compliant materials by atomic force microscopy
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1. Accurate Measurement of Porous Low-k Thin-Films by Nanoindentation: Densification Scaling versus Substrate Effects;ECS Journal of Solid State Science and Technology;2017
2. Buffer layer structure for measuring the elastic properties of brittle thin films by nanoindentation with application on nanoporous low-k dielectrics;Journal of Applied Physics;2015-03-21
3. Effect of low-frequency radio frequency on plasma-enhanced chemical vapor deposited ultra low-κ dielectric films for very large-scale integrated interconnects;Journal of Applied Physics;2014-04-14
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