High-Resolution Patterning of Various Large-Area, Highly Ordered Structural Motifs by Directional Photofluidization Lithography: Sub-30-nm Line, Ellipsoid, Rectangle, and Circle Arrays-Reference-Cited by-同舟云学术

High-Resolution Patterning of Various Large-Area, Highly Ordered Structural Motifs by Directional Photofluidization Lithography: Sub-30-nm Line, Ellipsoid, Rectangle, and Circle Arrays

Published:2011-03-15 Issue:10 Volume:21 Page:1770-1778
ISSN:1616-301X
Container-title:Advanced Functional Materials
language:en
Short-container-title:Adv. Funct. Mater.

Author:

Lee Seungwoo,Kang Hong Suk,Park Jung-Ki

Publisher

Wiley

Subject

Electrochemistry,Condensed Matter Physics,Biomaterials,Electronic, Optical and Magnetic Materials

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/adfm.201001927/fullpdf

Reference59 articles.

1. New Approaches to Nanofabrication: Molding, Printing, and Other Techniques

2. Nanostructures in Biodiagnostics

3. Micro- and Nanopatterning Techniques for Organic Electronic and Optoelectronic Systems

4. Soft lithography for micro- and nanoscale patterning

5. "Dip-Pen" Nanolithography

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