Controlled Microfabrication of High-Aspect-Ratio Structures in Silicon at the Highest Etching Rates: The Role of H2O2in the Anodic Dissolution of Silicon in Acidic Electrolytes-Reference-Cited by-同舟云学术

Controlled Microfabrication of High-Aspect-Ratio Structures in Silicon at the Highest Etching Rates: The Role of H2O2in the Anodic Dissolution of Silicon in Acidic Electrolytes

Published:2016-12-12 Issue:6 Volume:27 Page:1604310
ISSN:1616-301X
Container-title:Advanced Functional Materials
language:en
Short-container-title:Adv. Funct. Mater.

Author:

Cozzi Chiara¹,Polito Giovanni¹,Kolasinski Kurt W.²,Barillaro Giuseppe¹

Affiliation:

1. Dipartimento di Ingegneria dell'Informazione; Università di Pisa; via G. Caruso 16 56122 Pisa Italy

2. Department of Chemistry; West Chester University; West Chester PA 19383 USA

Funder

ECSEL

Publisher

Wiley

Subject

Electrochemistry,Condensed Matter Physics,Biomaterials,Electronic, Optical and Magnetic Materials

Reference38 articles.

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5. Wavelength-scale stationary-wave integrated Fourier-transform spectrometry

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