Eliminating the Trade-Off between the Throughput and Pattern Quality of Sub-15 nm Directed Self-Assembly via Warm Solvent Annealing-Reference-Cited by-同舟云学术

Eliminating the Trade-Off between the Throughput and Pattern Quality of Sub-15 nm Directed Self-Assembly via Warm Solvent Annealing

Published:2014-11-19 Issue:2 Volume:25 Page:306-315
ISSN:1616-301X
Container-title:Advanced Functional Materials
language:en
Short-container-title:Adv. Funct. Mater.

Author:

Kim Jong Min¹,Kim YongJoo¹,Park Woon Ik¹,Hur Yoon Hyung¹,Jeong Jae Won¹,Sim Dong Min¹,Baek Kwang Min¹,Lee Jung Hye¹,Kim Mi-Jeong²,Jung Yeon Sik¹

Affiliation:

1. Department of Materials Science and Engineering; Korea Advanced Institute of Science and Technology; 291 Daehak-ro Yuseong-gu Daejeon 305-701 Republic of Korea

2. Samsung Advanced Institute of Technology (SAIT); Mt. 14-1, Nongseo-dong, Giheung-gu Yongin-si Gyeonggi-do 446-712 Republic of Korea

Publisher

Wiley

Subject

Electrochemistry,Condensed Matter Physics,Biomaterials,Electronic, Optical and Magnetic Materials

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/adfm.201401529/fullpdf

Reference48 articles.

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5. Directing the self-assembly of block copolymers

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