A Top Coat with Solvent Annealing Enables Perpendicular Orientation of Sub-10 nm Microdomains in Si-Containing Block Copolymer Thin Films-Reference-Cited by-同舟云学术

A Top Coat with Solvent Annealing Enables Perpendicular Orientation of Sub-10 nm Microdomains in Si-Containing Block Copolymer Thin Films

Author:

Kim Eunjin¹²,Kim Wonjung³,Lee Kwang Hee²,Ross Caroline A.⁴,Son Jeong Gon¹

Affiliation:

1. Photo-Electronic Hybrids Research Center; Korea Institute of Science and Technology (KIST); Seoul 136-791 Korea

2. Department of Polymer Science and Engineering; Inha University; Incheon 402-751 Korea

3. Department of Mechanical Engineering; Sogang University; Seoul 121-742 Korea

4. Department of Materials Science and Engineering; Massachusetts Institute of Technology; Cambridge MA 02139 USA

Publisher

Wiley

Subject

Electrochemistry,Condensed Matter Physics,Biomaterials,Electronic, Optical and Magnetic Materials

Reference44 articles.

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