Plasma-Assisted Atomic Layer Deposition of PtOxfrom (MeCp)PtMe3and O2Plasma
Author:
Affiliation:
1. Eindhoven University of Technology; PO Box 513, 5600 MB Eindhoven (The Netherlands)
2. Holst Centre (IMEC-NL); PO Box 8550, 5605 KN Eindhoven (The Netherlands)
3. Holst Centre (TNO); PO Box 8550, 5605 KN Eindhoven (The Netherlands)
Publisher
Wiley
Subject
Process Chemistry and Technology,Surfaces and Interfaces,General Chemistry
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