Thin Films of High-kOxides and ZnO for Transparent Electronic Devices-Reference-Cited by-同舟云学术

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Thin Films of High-kOxides and ZnO for Transparent Electronic Devices

Published:2013-05-29 Issue:4-6 Volume:19 Page:213-220
ISSN:0948-1907
Container-title:Chemical Vapor Deposition
language:en
Short-container-title:Chem. Vap. Deposition

Author:

Gieraltowska Sylwia,Wachnicki Lukasz,Witkowski Bartlomiej S.,Guziewicz Elzbieta,Godlewski Marek

Publisher

Wiley

Subject

Process Chemistry and Technology,Surfaces and Interfaces,General Chemistry

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/cvde.201207029/fullpdf

Reference34 articles.

2. Transparent Electronics

3. Transparent thin film transistors using ZnO as an active channel layer and their electrical properties

4. ZnO-based transparent thin-film transistors

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3. Bias-stress instabilities in low-temperature thin-film transistors made of Al2O3 and ZnO films deposited by PEALD;Microelectronic Engineering;2022-04

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