Tribological study of hafnium dioxide and aluminium oxide films grown by atomic layer deposition on glass substrate

Author:

Pietruszka R.ORCID,Witkowski B.S.,Zimowski S.,Stapinski T.,Godlewski M.

Funder

National Centre for Research and Development

Polish Ministry of Science and Higher Education

AGH University of Science and Technology

AGH-UST

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference22 articles.

1. Aleskovskii's “framework” hypothesis to the method of molecular layering/atomic layer deposition;Malygin;Chem. Vap. Deposition,2015

2. Short history of atomic layer deposition: Tuomosuntola's atomic layer epitaxy;Puurunen;Chem. Vap. Deposition,2014

3. Atomic layer deposition chemistry: recent developments and future challenges;Leskelä;Angew. Chem. Int. Ed.,2003

4. Low temperature and roll-to-roll spatial atomic layer deposition for flexible electronics;Poodt;J. Vac. Sci. Technol. A,2012

5. G. Dewey, M. Metz, J. Kavalieros, R. Chau, US patent app. US 11/863,211, US20090085082 A1, publication Sep. 27, 2007.

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