Developments of TaN ALD Process for 3D Conformal Coatings-Reference-Cited by-同舟云学术

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Developments of TaN ALD Process for 3D Conformal Coatings

Published:2011-12 Issue:10-12 Volume:17 Page:284-295
ISSN:0948-1907
Container-title:Chemical Vapor Deposition
language:en
Short-container-title:Chem. Vap. Deposition

Author:

Brizé Virginie,Prieur Thomas,Violet Perrine,Artaud Laurent,Berthomé Grégory,Blanquet Elisabeth,Boichot Raphaël,Coindeau Stéphane,Doisneau Béatrice,Farcy Alexis,Mantoux Arnaud,Nuta Ioana,Pons Michel,Volpi Fabien

Publisher

Wiley

Subject

Process Chemistry and Technology,Surfaces and Interfaces,General Chemistry

Reference42 articles.

1. Atomic layer epitaxy

2. Atomic Layer Deposition Chemistry: Recent Developments and Future Challenges

3. CuInS2 Thin Films Deposited by ALD

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Characterization of vapor draw vessel performance for low-volatility solid precursor delivery;Journal of Vacuum Science & Technology A;2021-01

2. Impact of silica-substrate chemistry on tantalum nitride thin films deposited by atomic layer deposition: Microstructure, chemistry and electrical behaviors;Thin Solid Films;2019-01

3. A Novel Method for the Metallization of 3D Silicon Induced by Metastable Copper Nanoparticles;ACS Applied Materials & Interfaces;2018-09-05

4. Modification and Resonance Tuning of Optical Microcavities by Atomic Layer Deposition;Chemical Vapor Deposition;2014-06

5. Color-tuning method by filling porous alumina membrane using atomic layer deposition based on metal–dielectric–metal structure;Applied Optics;2013-12-09

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