Atomic Layer Deposition of Tantalum Oxide and Tantalum Silicate from Chloride Precursors-Reference-Cited by-同舟云学术

Atomic Layer Deposition of Tantalum Oxide and Tantalum Silicate from Chloride Precursors

Published:2012-07-25 Issue:7-9 Volume:18 Page:225-238
ISSN:0948-1907
Container-title:Chemical Vapor Deposition
language:en
Short-container-title:Chem. Vap. Deposition

Author:

Adelmann Christoph,Delabie Annelies,Schepers Bart,Rodriguez Leonard N. J.,Franquet Alexis,Conard Thierry,Opsomer Karl,Vaesen Inge,Moussa Alain,Pourtois Geoffrey,Pierloot Kristine,Caymax Matty,Van Elshocht Sven

Publisher

Wiley

Subject

Process Chemistry and Technology,Surfaces and Interfaces,General Chemistry

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/cvde.201106967/fullpdf

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3. Tantalum pentoxide (Ta2O5) thin films for advanced dielectric applications

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5. Highly reliable, high-C DRAM storage capacitors with CVD TA/sub 2/O/sub 5/ films on rugged polysilicon

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