Effect of Annealing Temperature on Microstructure and UV Light Photocatalytic Activity of TiO2Films Grown by Atmospheric Pressure CVD
Author:
Affiliation:
1. School of Electrical and Electronic Engineering; Nanyang Technological University; 50 Nanyang Avenue Singapore 639798 (Singapore)
2. Singapore Institute of Manufacturing Technology; 71 Nanyang Drive Singapore 638075 (Singapore)
Publisher
Wiley
Subject
Process Chemistry and Technology,Surfaces and Interfaces,General Chemistry
Link
http://onlinelibrary.wiley.com/wol1/doi/10.1002/cvde.201207015/fullpdf
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