One-Step Direct-Patterning Template Utilizing Self-Assembly of POSS-Containing Block Copolymers-Reference-Cited by-同舟云学术

One-Step Direct-Patterning Template Utilizing Self-Assembly of POSS-Containing Block Copolymers

Published:2009-11-20 Issue:43 Volume:21 Page:4334-4338
ISSN:0935-9648
Container-title:Advanced Materials
language:en
Short-container-title:Adv. Mater.

Author:

Hirai Tomoyasu,Leolukman Melvina,Liu Chi Chun,Han Eungnak,Kim Yun Jun,Ishida Yoshihito,Hayakawa Teruaki,Kakimoto Masa-aki,Nealey Paul F.,Gopalan Padma

Publisher

Wiley

Subject

Mechanical Engineering,Mechanics of Materials,General Materials Science

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/adma.200900518/fullpdf

Reference31 articles.

1. Integration of self-assembled diblock copolymers for semiconductor capacitor fabrication

2. Fabrication of patterned media for high density magnetic storage

3. Sub-50 nm feature sizes using positive tone molecular glass resists for EUV lithography

4. Potential of a rotary stage electron beam mastering system for fabricating patterned magnetic media

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