Potential Precursor Alternatives to the Pyrophoric Trimethylaluminium for the Atomic Layer Deposition of Aluminium Oxide-Reference-Cited by-同舟云学术

Potential Precursor Alternatives to the Pyrophoric Trimethylaluminium for the Atomic Layer Deposition of Aluminium Oxide

Published:2019-04-26 Issue:31 Volume:25 Page:7489-7500
ISSN:0947-6539
Container-title:Chemistry – A European Journal
language:en
Short-container-title:Chem. Eur. J.

Author:

Mai Lukas¹^ORCID,Boysen Nils¹^ORCID,Zanders David¹^ORCID,de los Arcos Teresa²,Mitschker Felix³,Mallick Bert¹,Grundmeier Guido²,Awakowicz Peter³,Devi Anjana¹^ORCID

Affiliation:

1. Inorganic Materials ChemistryRuhr University Bochum Universitätsstraße 150 44801 Bochum Germany

2. Technical and Macromolecular ChemistryUniversity of Paderborn Warburger Straße 100 33098 Paderborn Germany

3. Institute of Electrical Engineering and Plasma TechnologyRuhr University Bochum Universitätsstraße 150 44801 Bochum Germany

Funder

Deutsche Forschungsgemeinschaft

Publisher

Wiley

Subject

General Chemistry,Catalysis,Organic Chemistry

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/chem.201900475

Reference64 articles.

2. Coating of Cemented Carbide Cutting Tools with Alumina by Chemical Vapor Deposition

3. Preparation of alumina coatings by chemical vapour deposition

4. Top gate ZnO−Al2O3thin film transistors fabricated using a chemical bath deposition technique

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