Self-reducing precursors for aluminium metal thin films: evaluation of stable aluminium hydrides for vapor phase aluminium deposition-Reference-Cited by-同舟云学术

Self-reducing precursors for aluminium metal thin films: evaluation of stable aluminium hydrides for vapor phase aluminium deposition

Published:2024 Issue:18 Volume:53 Page:7711-7720
ISSN:1477-9226
Container-title:Dalton Transactions
language:en
Short-container-title:Dalton Trans.

Author:

Huster Niklas¹^ORCID,Mullins Rita²,Nolan Michael²^ORCID,Devi Anjana¹³⁴⁵^ORCID

Affiliation:

1. Inorganic Materials Chemistry, Faculty of Chemistry and Biochemistry, Ruhr University Bochum, Universitätsstr. 150, 44801 Bochum, Germany

2. Tyndall National Institute, Lee Maltings, University College Cork, Cork T12 R5CP, Ireland

3. Leibniz Institute for Solid State and Materials Research, Helmholtzstr. 20, 01069 Dresden, Germany

4. Fraunhofer Institute for Microelectronic Circuits and Systems (IMS), Finkenstr. 61, 47057, Duisburg, Germany

5. Chair of Materials Chemistry, TU Dresden, Bergstr. 66, 01069, Dresden, Germany

Abstract

Aluminium hydride based complexes were synthesized and characterised with the scope of employing them as Al precursors in chemical vapor deposition processes that was suppored by DFT calculations.

Funder

Deutsche Forschungsgemeinschaft

Science Foundation Ireland

Publisher

Royal Society of Chemistry (RSC)

Link

http://pubs.rsc.org/en/content/articlepdf/2024/DT/D4DT00709C

Reference47 articles.

1. Review on metal packaging: materials, forms, food applications, safety and recyclability

2. Aluminium Foil as a Food Packaging Material in Comparison with Other Materials

3. Fundamentals of Aluminium Metallurgy , ed. R. Lumley , Woodhead , Oxford , 2011

4. E. A.Starke and J. T.Staley , in Fundamentals of Aluminium Metallurgy , ed. R. Lumley , Woodhead , Oxford , 2011 , pp. 747–783

5. A review: drilling performance and hole quality of aluminium alloys for aerospace applications