Unearthing [3-(Dimethylamino)propyl]aluminium(III) Complexes as Novel Atomic Layer Deposition (ALD) Precursors for Al2 O3 : Synthesis, Characterization and ALD Process Development-Reference-Cited by-同舟云学术

Unearthing [3-(Dimethylamino)propyl]aluminium(III) Complexes as Novel Atomic Layer Deposition (ALD) Precursors for Al2 O3 : Synthesis, Characterization and ALD Process Development

Published:2017-07-24 Issue:45 Volume:23 Page:10768-10772
ISSN:0947-6539
Container-title:Chemistry - A European Journal
language:en
Short-container-title:Chem. Eur. J.

Author:

Mai Lukas¹^ORCID,Gebhard Maximilian¹,de los Arcos Teresa²,Giner Ignacio²,Mitschker Felix³,Winter Manuela¹,Parala Harish¹,Awakowicz Peter³,Grundmeier Guido²,Devi Anjana¹^ORCID

Affiliation:

1. Inorganic Materials Chemistry; Ruhr-University Bochum; Universitätsstraße 150 44801 Bochum Germany

2. Macromolecular and Technical Chemistry; University of Paderborn; Warburger Straße 100 33098 Paderborn Germany

3. Institute of Electrical Engineering and Plasma Technology; Ruhr-University Bochum; 44801 Bochum Germany

Funder

Deutsche Forschungsgemeinschaft

Publisher

Wiley

Subject

General Chemistry,Catalysis,Organic Chemistry

Reference43 articles.

1. State of the art on high-temperature corrosion-resistant coatings