CVD of Metals Using Alcohols and Metal Acetylacetonates, Part I: Optimization of Process Parameters and Electrical Characterization of Synthesized Films-Reference-Cited by-同舟云学术

CVD of Metals Using Alcohols and Metal Acetylacetonates, Part I: Optimization of Process Parameters and Electrical Characterization of Synthesized Films

Published:2007-05 Issue:5 Volume:13 Page:219-226
ISSN:0948-1907
Container-title:Chemical Vapor Deposition
language:en
Short-container-title:Chem. Vap. Deposition

Author:

Premkumar P.A.,Bahlawane N.,Kohse-Höinghaus K.

Publisher

Wiley

Subject

Process Chemistry and Technology,Surfaces and Interfaces,General Chemistry

Reference35 articles.

1. Mechanism of Ni Film CVD with a Ni(ktfaa)2 Precursor on a Copper Substrate

2. Low temperature chemical vapor deposition of Co thin films from Co2(CO)8

3. Metal Organic CVD of Cobalt Thin Films Using Cobalt Tricarbonyl Nitrosyl

4. Studies of metallic thin film growth in an atomic layer epitaxy reactor using M(acac)2 (M=Ni, Cu, Pt) precursors

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