CVD of Metals Using Alcohols and Metal Acetylacetonates, Part I: Optimization of Process Parameters and Electrical Characterization of Synthesized Films
Author:
Publisher
Wiley
Subject
Process Chemistry and Technology,Surfaces and Interfaces,General Chemistry
Reference35 articles.
1. Mechanism of Ni Film CVD with a Ni(ktfaa)2 Precursor on a Copper Substrate
2. Low temperature chemical vapor deposition of Co thin films from Co2(CO)8
3. Metal Organic CVD of Cobalt Thin Films Using Cobalt Tricarbonyl Nitrosyl
4. Studies of metallic thin film growth in an atomic layer epitaxy reactor using M(acac)2 (M=Ni, Cu, Pt) precursors
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