Linear Extended ArcJet-CVD - a New PECVD Approach for Continuous Wide Area Coating Under Atmospheric Pressure-Reference-Cited by-同舟云学术

Linear Extended ArcJet-CVD - a New PECVD Approach for Continuous Wide Area Coating Under Atmospheric Pressure

Published:2005-12 Issue:11-12 Volume:11 Page:510-522
ISSN:0948-1907
Container-title:Chemical Vapor Deposition
language:en
Short-container-title:Chem. Vap. Deposition

Author:

Hopfe V.,Rogler D.,Maeder G.,Dani I.,Landes K.,Theophile E.,Dzulko M.,Rohrer C.,Reichhold C.

Publisher

Wiley

Subject

Process Chemistry and Technology,Surfaces and Interfaces,General Chemistry

Reference25 articles.

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4. Plasma-enhanced chemical-vapour-deposition of thin films by corona discharge at atmospheric pressure

5. SiO2thin film deposition by radio frequency oxygen plasma enhanced laser ablation from Si

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