Structural, Optical, and Electrical Characterization of ZnO and Al-doped ZnO Thin Films Deposited by MOCVD-Reference-Cited by-同舟云学术

Structural, Optical, and Electrical Characterization of ZnO and Al-doped ZnO Thin Films Deposited by MOCVD

Published:2009-12-07 Issue: Volume: Page:n/a-n/a
ISSN:0948-1907
Container-title:Chemical Vapor Deposition
language:en
Short-container-title:Chem. Vap. Deposition

Author:

FragalÃ Maria Elena,Malandrino Graziella,Giangregorio Maria Michela,Losurdo Maria,Bruno Giovanni,Lettieri Stefano,Amato Luigi Santamaria,Maddalena Pasquale

Publisher

Wiley

Subject

Process Chemistry and Technology,Surfaces and Interfaces,General Chemistry

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/cvde.200906790/fullpdf

Reference40 articles.

1. Transparent Conducting Oxides for Photovoltaics

2. Chemical and Structural Factors Governing Transparent Conductivity in Oxides

3. Atmospheric pressure chemical vapor deposition of transparent conducting films of fluorine doped zinc oxide and their application to amorphous silicon solar cells

4. A comprehensive review of ZnO materials and devices

5. Novel nanostructures of ZnO for nanoscale photonics, optoelectronics, piezoelectricity, and sensing

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