Atomic Layer Deposition, Characterization, and Dielectric Properties of HfO2/SiO2 Nanolaminates and Comparisons with Their Homogeneous Mixtures
Author:
Publisher
Wiley
Subject
Process Chemistry and Technology,Surfaces and Interfaces,General Chemistry
Reference35 articles.
1. High-κ gate dielectrics: Current status and materials properties considerations
2. Some recent developments in the MOCVD and ALD of high-κ dielectric oxides
3. Tailoring the dielectric properties of HfO2–Ta2O5 nanolaminates
4. Characterisation of ALCVD Al2O3–ZrO2 nanolaminates, link between electrical and structural properties
5. Dielectric characteristics of Al2O3–HfO2 nanolaminates on Si(100)
Cited by 39 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Catalytic atomic layer deposition of amorphous alumina–silica thin films on carbon microfibers;Journal of Vacuum Science & Technology A;2024-04-12
2. Sequential Infiltration Synthesis of Silicon Dioxide in Polymers with Ester Groups─Insight from In Situ Infrared Spectroscopy;The Journal of Physical Chemistry C;2024-04-03
3. Nanoscale dielectric properties of TiO2 in SiO2 nanocomposite deposited by hybrid PECVD method;Nano Express;2024-02-07
4. Atomic layer deposition mechanism of hafnium dioxide using hafnium precursor with amino ligands and water;Surfaces and Interfaces;2024-01
5. Investigation of PEALD ZrO2/La2O3-based high-k nanolaminates sandwiched between Al and Ti electrodes for MIM capacitors;Journal of Materials Science: Materials in Electronics;2023-06
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3