Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
Author:
Publisher
Wiley
Subject
Process Chemistry and Technology,Surfaces and Interfaces,General Chemistry
Reference56 articles.
1. Comparison of the properties of titanium dioxide films prepared by various techniques
2. Atomic layer growth of epitaxial TiO2 thin films from TiCl4 and H2O on α-Al2O3 substrates
3. High-κ gate dielectrics: Current status and materials properties considerations
4. Identification of a determining parameter for resistive switching of TiO2 thin films
5. Resistive switching mechanism of TiO2 thin films grown by atomic-layer deposition
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