High Performance Indium‐Gallium‐Zinc Oxide Thin Film Transistor via Interface Engineering

Author:

Zhao Yepin1,Wang Zhengxu1,Xu Guangwei12,Cai Le1,Han Tae‐Hee13,Zhang Anni1,Wu Quantan1,Wang Rui1,Huang Tianyi1,Cheng Pei1,Chang Sheng‐Yung1,Bao Daqian1,Zhao Zhiyu1,Wang Minhuan1,Huang Yijie1,Yang Yang1ORCID

Affiliation:

1. Department of Materials Science and Engineering and California Nano Systems InstituteUniversity of California Los Angeles California 90095 USA

2. School of MicroelectronicsUniversity of Science and Technology of China Hefei Anhui Province 230026 China

3. Division of Materials Science and EngineeringHanyang University Seoul 04763 Republic of Korea

Publisher

Wiley

Subject

Electrochemistry,Condensed Matter Physics,Biomaterials,Electronic, Optical and Magnetic Materials

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