Producing Silicon Carbide Micro and Nanostructures by Plasma‐Free Metal‐Assisted Chemical Etching-Reference-Cited by-同舟云学术

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Producing Silicon Carbide Micro and Nanostructures by Plasma‐Free Metal‐Assisted Chemical Etching

Published:2021-06-10 Issue:32 Volume:31 Page:2103298
ISSN:1616-301X
Container-title:Advanced Functional Materials
language:en
Short-container-title:Adv. Funct. Mater.

Author:

Michaels Julian A.¹^ORCID,Janavicius Lukas¹,Wu Xihang¹,Chan Clarence¹,Huang Hsieh‐Chih¹,Namiki Shunya¹,Kim Munho¹,Sievers Dane¹,Li Xiuling¹^ORCID

Affiliation:

1. Department of Electrical and Computer Engineering Nick Holonyak Jr. Micro and Nanotechnology Laboratory University of Illinois Urbana IL 61801 USA

Funder

National Science Foundation

Publisher

Wiley

Subject

Electrochemistry,Condensed Matter Physics,Biomaterials,Electronic, Optical and Magnetic Materials

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/adfm.202103298

Reference51 articles.

1. Materials: Silicon and beyond

2. Status of silicon carbide (SiC) as a wide-bandgap semiconductor for high-temperature applications: A review

3. An assessment of wide bandgap semiconductors for power devices

4. Semiempirical model of carrier mobility in silicon carbide for analyzing its dependence on temperature and doping level

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1. A novel synthesis from instability difference between SiC 3-C and 6-H crystal to form nanoparticles stems by alkali solution and its degrading various environmental pollutants;Ceramics International;2024-05

2. Demystifying metal-assisted chemical etching of GaN and related heterojunctions;Applied Physics Reviews;2024-04-30

3. Plasma‐Damage Free Efficiency Scaling of Micro‐LEDs by Metal‐Assisted Chemical Etching;Advanced Optical Materials;2024-04-03

4. Femtosecond Laser-Induced Phase Transformation on Single-Crystal 6H-SiC;Micromachines;2024-02-06

5. Helium Ion‐Assisted Wet Etching of Silicon Carbide with Extremely Low Roughness for High‐Quality Nanofabrication;Small Methods;2024-01-07

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