CMOS-compatible electrochemical nanoimprint: High throughput fabrication of ordered microstructures on semiconductor wafer by using a glassy carbon mold-Reference-Cited by-同舟云学术

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CMOS-compatible electrochemical nanoimprint: High throughput fabrication of ordered microstructures on semiconductor wafer by using a glassy carbon mold

Published:2023-09 Issue: Volume:462 Page:142700
ISSN:0013-4686
Container-title:Electrochimica Acta
language:en
Short-container-title:Electrochimica Acta

Author:

Sun Wanshi,Xu Hantao,Han Lianhuan,Wang Chao,Ye Zuoyan,Su Jian-Jia,Wu Yuan-Fei,Luo Shiyi,Zhan Dongping

Funder

National Natural Science Foundation of China

Higher Education Discipline Innovation Project

Publisher

Elsevier BV

Subject

Electrochemistry,General Chemical Engineering

Reference63 articles.

1. Planar-type concentrating photovoltaics with cylindrical lenses directly integrated with thin flexible GaAs solar cells;Lee;Prog. Photovoltaics Res. Appl.,2020

2. Mid-infrared GaAs/AlGaAs micro-ring resonators characterized via thermal tuning;Haas;RSC Adv.,2019

3. Gas sensing properties of single crystalline porous silicon nanowires;Peng;Appl. Phys. Lett.,2009

4. Micro-LEDs, a manufacturability perspective;Ding;Appl. Sci.,2019

5. Sustained high external quantum efficiency in ultrasmall blue III–nitride micro-LEDs;Hwang;Appl. Phys. Express.,2017

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1. Scanning Electrochemical Probe Lithography for Ultra‐Precision Machining of Micro‐Optical Elements with Freeform Curved Surface;Small;2024-06-28

2. Metal-assisted chemical etching beyond Si: applications to III–V compounds and wide-bandgap semiconductors;Nanoscale;2024

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