Atmospheric Pressure Chemical Vapour Deposition of TiCl 4 and t BuAsH 2 to Form Titanium Arsenide Thin Films
Author:
Affiliation:
1. Materials Chemistry Centre, Department of Chemistry, University College London, 20 Gordon St., London, WC1H 0AJ, United Kingdom
Publisher
Wiley
Subject
Inorganic Chemistry
Link
https://onlinelibrary.wiley.com/doi/pdf/10.1002/ejic.201000839
Reference40 articles.
1. Friction and wear characteristics of TiN, TiCN and diamond-like carbon films
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3. Chemical vapor deposition of titanium nitride at low temperatures
4. Chemical vapor deposition of titanium, zirconium, and hafnium nitride thin films
5. Synthesis of thin films by atmospheric pressure chemical vapor deposition using amido and imido titanium(IV) compounds as precursors
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