Formation of High-Pressure Phase of Titanium Dioxide (TiO2 -II) Thin Films by Vapor-Liquid-Solid Growth Process on GaAs Substrate-Reference-Cited by-同舟云学术

Formation of High-Pressure Phase of Titanium Dioxide (TiO2 -II) Thin Films by Vapor-Liquid-Solid Growth Process on GaAs Substrate

Published:2018-11-16 Issue:2 Volume:216 Page:1800640
ISSN:1862-6300
Container-title:physica status solidi (a)
language:en
Short-container-title:Phys. Status Solidi A

Author:

Das Anindita¹,Nag Chowdhury Basudev²,Saha Rajib²,Sikdar Subhrajit²,Sultana Jenifar¹,Kumar Dalapati Goutam³,Chattopadhyay Sanatan²

Affiliation:

1. Centre for Research in Nanoscience and Nanotechnology (CRNN); University of Calcutta; Calcutta India

2. Department of Electronic Science; University of Calcutta; Calcutta India

3. Institute of Materials Research and Engineering; A*STAR (Agency for Science, Technology and Research); Singapore

Publisher

Wiley

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/pssa.201800640/fullpdf

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