Atomistic study of band structure and transport in extremely thin channel InP MOSFETs

Author:

Dutta Tapas1,Kumar Piyush1,Rastogi Priyank1,Agarwal Amit2,Chauhan Yogesh Singh1

Affiliation:

1. Department of Electrical Engineering; Indian Institute of Technology Kanpur; Kanpur India

2. Department of Physics; Indian Institute of Technology Kanpur; Kanpur India

Publisher

Wiley

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Reference38 articles.

1. M. Bohr 1 6 2011

2. Power-constrained CMOS scaling limits

3. Y. S. Chauhan D. D. Lu V. Sriramkumar S. Khandelwal J. P. Duarte N. Payvadosi A. Niknejad C. Hu

4. Quantum Confinement Effects in Extremely Thin Body Germanium n-MOSFETs

5. Modeling SiGe FinFETs With Thin Fin and Current-Dependent Source/Drain Resistance

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