Formation of a Bistable Interstitial Complex in Irradiated p‐Type Silicon

Author:

Makarenko Leonid F.1ORCID,Lastovski Stanislav B.2,Yakushevich Hanna S.2,Gaubas Eugenijus3,Pavlov Jevgenij3,Kozlovski Vitali V.4,Moll Michael5,Pintilie Ioana6

Affiliation:

1. Department of Applied Mathematics and Computer ScienceBelarusian State University Independence Ave. 4 220030 Minsk Belarus

2. Laboratory of Radiation EffectsScientific-Practical Materials Research Centre of NAS of Belarus P. Browka Str. 17 220072 Minsk Belarus

3. Institute of Photonics and NanotechnologyVilnius University Sauletekio Av. 3 LT-10257 Vilnius Lithuania

4. Department of Experimental PhysicsPeter the Great St. Petersburg State Polytechnic University 195251 St. Petersburg Russia

5. EP DepartmentCERN CH-1211 Geneva 23 Switzerland

6. Department of Multifunctional Materials and StructuresNational Institute of Materials Physics Atomistilor Str. 405A Bucharest-Magurele 077125 Romania

Publisher

Wiley

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Cited by 6 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Carrier-induced formation of electrically active boron-interstitial clusters in irradiated boron-doped silicon;Journal of Applied Physics;2024-02-01

2. Scanning Photodielectric Spectroscopy of CdZnTe Crystals;Advances in Fabrication and Investigation of Nanomaterials for Industrial Applications;2024

3. Investigation of the Boron removal effect induced by 5.5 MeV electrons on highly doped EPI- and Cz-silicon;Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment;2023-11

4. The Boron–Oxygen (BᵢOᵢ) Defect Complex Induced by Irradiation With 23 GeV Protons in p-Type Epitaxial Silicon Diodes;IEEE Transactions on Nuclear Science;2022-03

5. Metastable acceptors in boron doped silicon: evidence of the defects contributing to carrier induced degradation;Journal of Physics D: Applied Physics;2021-04-20

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