Spectral Characteristics and Spatial Distribution of Thermal Donors in n‐Type Czochralski‐Silicon Wafers-Reference-Cited by-同舟云学术

Spectral Characteristics and Spatial Distribution of Thermal Donors in n‐Type Czochralski‐Silicon Wafers

Published:2020-03 Issue:6 Volume:217 Page:1900884
ISSN:1862-6300
Container-title:physica status solidi (a)
language:en
Short-container-title:Phys. Status Solidi A

Author:

Olsen Espen¹^ORCID,Helander Malin I.¹,Mehl Torbjørn¹,Burud Ingunn¹

Affiliation:

1. Faculty of Science and TechnologyNorwegian University of Life Sciences (NMBU) Universitetstunet 3 1432 Ås Norway

Funder

Norges Forskningsråd

Publisher

Wiley

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/pssa.201900884

Reference20 articles.

1. Effect of Heat Treatment upon the Electrical Properties of Silicon Crystals

2. Mechanism of the Formation of Donor States in Heat-Treated Silicon

3. Deep Level Luminescence Ralated to Thermal Donors in Silicon

4. Number of oxygen atoms in a thermal donor in silicon

5. Oxygen diffusion and thermal donor formation in silicon

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