Effect of O2 plasma on properties of electrolyte-insulator-semiconductor structures-Reference-Cited by-同舟云学术

Effect of O2 plasma on properties of electrolyte-insulator-semiconductor structures

Published:2017-03-28 Issue:9 Volume:214 Page:1700025
ISSN:1862-6300
Container-title:physica status solidi (a)
language:en
Short-container-title:Phys. Status Solidi A

Author:

Arreola Julio¹²,Keusgen Michael²,Schöning Michael J.¹³

Affiliation:

1. Institute of Nano- and Biotechnologies; Aachen University of Applied Sciences; Heinrich-Mußmann-Straße 1 52428 Jülich Germany

2. Institute of Pharmaceutical Chemistry; Philipps-University Marburg; Marbacher Weg 6-10 35032 Marburg Germany

3. Research Center Jülich GmbH; Peter Grünberg Institute (PGI-8); Wilhelm-Johnen-Straße 52428 Jülich Germany

Funder

Bundesministerium für Bildung und Forschung

Publisher

Wiley

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Reference29 articles.

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4. Molecular Structure of 3-Aminopropyltriethoxysilane Layers Formed on Silanol-Terminated Silicon Surfaces

5. Biomaterials - Physics and Chemistry

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