CVD precursors for transition metal oxide nanostructures: molecular properties, surface behavior and temperature effects-Reference-Cited by-同舟云学术

CVD precursors for transition metal oxide nanostructures: molecular properties, surface behavior and temperature effects

Published:2013-10-08 Issue:2 Volume:211 Page:251-259
ISSN:1862-6300
Container-title:physica status solidi (a)
language:en
Short-container-title:Phys. Status Solidi A

Author:

Tabacchi Gloria¹,Fois Ettore¹,Barreca Davide²,Gasparotto Alberto³

Affiliation:

1. Department of Science and High Technology; Insubria University and INSTM; 22100 Como Italy

2. CNR-IENI and INSTM, Department of Chemistry; Padova University; 35131 Padova Italy

3. Department of Chemistry; Padova University and INSTM; 35131 Padova Italy

Funder

CINECA supercomputing center“MONA”

Padova University

Insubria University FAR 2012

Insubria University, Como, Italy

Publisher

Wiley

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/pssa.201330085/fullpdf

Reference46 articles.

1. Multi-component oxide nanosystems by Chemical Vapor Deposition and related routes: challenges and perspectives

2. Opening the Pandora's jar of molecule-to-material conversion in chemical vapor deposition: Insights from theory

3. Design of precursors for the CVD of inorganic thin films

4. Volatilities of Actinide and Lanthanide N,N-Dimethylaminodiboranate Chemical Vapor Deposition Precursors: A DFT Study

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