Formation of deprotected fuzzy blobs in chemically amplified resists-Reference-Cited by-同舟云学术

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Formation of deprotected fuzzy blobs in chemically amplified resists

Published:2004-07-30 Issue:17 Volume:42 Page:3063-3069
ISSN:0887-6266
Container-title:Journal of Polymer Science Part B: Polymer Physics
language:en
Short-container-title:J. Polym. Sci. B Polym. Phys.

Author:

Jones Ronald L.,Hu Tengjiao,Lin Eric K.,Wu Wen-Li,Goldfarb Dario L.,Angelopoulos Marie,Trinque Brian C.,Schmid Gerard M.,Stewart Michael D.,Willson C. Grant

Publisher

Wiley

Subject

Materials Chemistry,Polymers and Plastics,Physical and Theoretical Chemistry,Condensed Matter Physics

Cited by 12 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Neutron Reflectivity Characterization of the Photoacid Reaction-Diffusion Latent and Developed Images of Molecular Resists for Extreme Ultraviolet Lithography;Langmuir;2012-05-11

2. Understanding Acid Reaction and Diffusion in Chemically Amplified Photoresists: An Approach at the Molecular Level;The Journal of Physical Chemistry C;2011-09-29

3. Polymer brush resist for responsive wettability;Soft Matter;2009

4. Solid state NMR investigation of photoresist molecular glasses including blend behavior with a photoacid generator;Journal of Materials Chemistry;2009

5. The effect of EUV molecular glass architecture on the bulk dispersion of a photo-acid generator;Advances in Resist Materials and Processing Technology XXV;2008-03-14

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