Mechanism of RF plasma induced fragmentation of SiCl4 and surface functionalization of polymeric substrates from SiClx species
Author:
Publisher
Wiley
Subject
Materials Chemistry,Polymers and Plastics,Surfaces, Coatings and Films,General Chemistry
Cited by 15 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Numerical Investigation of SiO2 Coating Deposition in Wafer Processing Reactors with SiCl4 /O2 /Ar Inductively Coupled Plasmas;Plasma Processes and Polymers;2013-05-28
2. Funcionalização de superfícies vítreas por plasma de SiCl4 para a retenção de compostos orgânicos;Cerâmica;2011-12
3. Silicenium Ions-Experimental Aspects;PATAI'S Chemistry of Functional Groups;2009-12-15
4. Grafting of Paper by Silane Coupling Agents Using Cold‐Plasma Discharges;Plasma Processes and Polymers;2008-07-18
5. Plasma-Mediated Grafting of Poly(ethylene glycol) on Polyamide and Polyester Surfaces and Evaluation of Antifouling Ability of Modified Substrates;Langmuir;2007-05-15
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