Alkaline‐developable positive‐type photosensitive polyimide with high mechanical strength and high resolution based on chain extendable poly(amic acid), thermally degradable cross‐linker and photoacid generator-Reference-Cited by-同舟云学术

Alkaline‐developable positive‐type photosensitive polyimide with high mechanical strength and high resolution based on chain extendable poly(amic acid), thermally degradable cross‐linker and photoacid generator

Published:2020-04 Issue:7 Volume:58 Page:948-955
ISSN:2642-4150
Container-title:Journal of Polymer Science
language:en
Short-container-title:Journal of Polymer Science

Author:

Yeh Yao‐Ming¹,Ueda Mitsuru¹²,Hsu Chain‐Shu¹³^ORCID

Affiliation:

1. Department of Applied ChemistryNational Chiao Tung University Hsinchu Taiwan

2. Department of Organic and Polymeric materialsTokyo Institute of Technology Tokyo Japan

3. Center for Emergent Functional Matter ScienceNational Chiao Tung University Hsinchu Taiwan

Funder

Ministry of Education

National Chiao Tung University

Ministry of Science and Technology, Taiwan

Publisher

Wiley

Subject

Materials Chemistry,Polymers and Plastics,Physical and Theoretical Chemistry

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/pol.20190230

Reference18 articles.

1. Recent progress in thermally stable and photosensitive polymers

2. Photosensitive engineering plastics based on reaction development patterning

3. The Design of Photosensitive Polyimide Materials for Buffer Coating Processes

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