Affiliation:
1. Hong Kong University of Science and Technology Hong Kong SAR China
2. Suzhou Institute of Nano‐Tech and Nano‐Bionics, Chinese Academy of Sciences Suzhou China
Abstract
As display technology continues to advance, UVA micro‐LEDs are becoming increasingly important in a variety of display and beyond‐display applications. In this study, we investigate the optoelectronic characteristics of UVA micro‐LEDs based on a homogeneously epitaxial structure on freestanding gallium nitride (GaN) substrates. The device exhibits a central wavelength of 390 nm, positioned at the overlap of UVA and visible light spectra. It demonstrates an impressively low ideality factor of 1.49 at 2.86 V and a series resistance of 9.88 O beyond 3 V. Optically, our device shows virtually no wavelength shift across a wide current density range of 0.1‐1000 A/cm2, indicating exceptional optical stability and color accuracy. The emitted light is typical purple, reaching an expansive color gamut of 115.3% of Rec.2020. Furthermore, the GaN‐on‐GaN structure, with its superior crystal structure and heat dissipation properties, results in a very low droop ratio in EQE. This ensures sustained highpower output at high current densities, showcasing great potential in applications such as 3D printing, maskless photolithography, and fluorescence tagging.