Measurement of C2 and CH temperatures in argon-acetylene low-pressure microwave-induced plasma
Author:
Affiliation:
1. Faculty of Physics; University of Belgrade; Belgrade Serbia
2. Military Academy; University of Defence; Belgrade Serbia
Funder
Ministarstvo Prosvete, Nauke i Tehnološkog Razvoja
Publisher
Wiley
Subject
Condensed Matter Physics
Link
http://onlinelibrary.wiley.com/wol1/doi/10.1002/ctpp.201800147/fullpdf
Reference44 articles.
1. Plasma-chemical reactions: low pressure acetylene plasmas
2. Determination of gas temperature and C2absolute density in Ar/H2/CH4microwave discharges used for nanocrystalline diamond deposition from the C2Mulliken system
3. Investigation of processes in low-pressure expanding thermal plasmas used for carbon nitride deposition: I. Ar/N2/C2H2plasma
4. Acetylene–argon plasmas measured at a biased substrate electrode for diamond-like carbon deposition: I. Mass spectrometry
5. Optical spectroscopy investigation of N2–CH4plasma jets simulating Titan atmospheric entry conditions
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