Determination of gas temperature and C2absolute density in Ar/H2/CH4microwave discharges used for nanocrystalline diamond deposition from the C2Mulliken system-Reference-Cited by-同舟云学术

Determination of gas temperature and C2absolute density in Ar/H2/CH4microwave discharges used for nanocrystalline diamond deposition from the C2Mulliken system

Published:2004-05-14 Issue:3 Volume:13 Page:375-386
ISSN:0963-0252
Container-title:Plasma Sources Science and Technology
language:
Short-container-title:Plasma Sources Sci. Technol.

Author:

Lombardi G,Bénédic F,Mohasseb F,Hassouni K,Gicquel A

Publisher

IOP Publishing

Subject

Condensed Matter Physics

Reference58 articles.

1. Deposition and characterization of nanocrystalline diamond films

2. Low-Pressure, Metastable Growth of Diamond and "Diamondlike" Phases

3. Scaling laws for diamond chemical‐vapor deposition. I. Diamond surface chemistry

4. Synthesis of nanocrystalline diamond thin films from an Ar–CH4 microwave plasma

5. Growth of highly transparent nanocrystalline diamond films and a spectroscopic study of the growth

Cited by 63 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Experimental studies and COMSOL 1-D simulation in Ar capacitively coupled plasmas;AIP Advances;2024-01-01

2. Effect of argon on microwave plasma chemical vapor deposition of diamond coatings from an H2+CH4+Ar mixture activated in a microwave discharge;Thermophysics and Aeromechanics;2023-10-23

3. Nongrowth regime in microwave chemical vapor deposition reactor due to formation of plasma nonhomogeneity;Plasma Processes and Polymers;2023-06-27

4. Gas-Jet Synthesis of Diamond Coatings from a H2+CH4+Ar Mixture Activated in a Microwave Discharge;Doklady Physics;2022-07

5. Imaging and Modeling C2 Radical Emissions from Microwave Plasma-Activated Methane/Hydrogen Gas Mixtures: Contributions from Chemiluminescent Reactions and Investigations of Higher-Pressure Effects and Plasma Constriction;The Journal of Physical Chemistry A;2021-05-09