Monte Carlo simulation of charging effects on linewidth metrology
Author:
Publisher
Wiley
Subject
Instrumentation,Atomic and Molecular Physics, and Optics
Link
http://onlinelibrary.wiley.com/wol1/doi/10.1002/sca.1998.4950200605/fullpdf
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4. Metrology of high-resolution resist structures on insulating substrates;Di Fabrizio;J Vac Sci Technol B,1993
5. Secondary electron line scans over high resolution resist images: Theoretical and experimental investigation of induced local electric field effects;Grella;J Vac Sci Technol B,1994
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