Nickel oxide thin films grown by chemical deposition techniques: Potential and challenges in next‐generation rigid and flexible device applications-Reference-Cited by-同舟云学术

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Nickel oxide thin films grown by chemical deposition techniques: Potential and challenges in next‐generation rigid and flexible device applications

Published:2020-08-06 Issue:5 Volume:3 Page:536-576
ISSN:2567-3165
Container-title:InfoMat
language:en
Short-container-title:InfoMat

Author:

Napari Mari¹²^ORCID,Huq Tahmida N.¹^ORCID,Hoye Robert L. Z.¹³^ORCID,MacManus‐Driscoll Judith L.¹^ORCID

Affiliation:

1. Department of Materials Science and Metallurgy University of Cambridge Cambridge UK

2. Centre for Electronics Frontiers Zepler Institute for Photonics and Nanoelectronics, University of Southampton Southampton UK

3. Department of Materials Imperial College London London UK

Funder

Engineering and Physical Sciences Research Council

Isaac Newton Trust

Royal Academy of Engineering

Publisher

Wiley

Subject

General Medicine

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/inf2.12146

Reference239 articles.

1. A Review of Low‐Temperature Solution‐Processed Metal Oxide Thin‐Film Transistors for Flexible Electronics

2. Towards Oxide Electronics: a Roadmap

3. Room-temperature fabrication of transparent flexible thin-film transistors using amorphous oxide semiconductors

4. Metal oxide semiconductor thin-film transistors for flexible electronics

5. Research Update: Doping ZnO and TiO2 for solar cells

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