Low-Pressure Chemical Vapor Deposition of Silicon Carbide Thin Films from Organopolysilanes
Author:
Publisher
Wiley
Subject
General Chemistry
Link
http://onlinelibrary.wiley.com/wol1/doi/10.1002/jccs.199100039/fullpdf
Reference12 articles.
1. Growth Characteristics of Alpha-Silicon Carbide
2. Chemical Vapor Deposition of Single Crystalline β ‐ SiC Films on Silicon Substrate with Sputtered SiC Intermediate Layer
3. Growth and morphology of 6H-SiC epitaxial layers by CVD
4. Yajima , S. Hayashi , J. Omori , M. Chem. Lett. 1975 931
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