Epitaxy of Strained Si/Si1-xGexHeterostructures
Author:
Publisher
John Wiley & Sons, Inc.
Link
http://onlinelibrary.wiley.com/wol1/doi/10.1002/9781118601044.ch4/fullpdf
Reference268 articles.
1. An efficient wet-cleaning of SiGe virtual substrates and of thick, pure Ge layers on Si(001) after a chemical mechanical planarization step
2. A Review of Different and Promising Defect Etching Techniques: from Si to Ge
3. Study of HCl and Secco Defect Etching for Characterization of Thick sSOI
4. Comparison of Different Etching Techniques in Order to Reveal Dislocations in Thick Ge Layers
5. Wet cleaning and surface characterization of Si1−xGex virtual substrates after a CMP step
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