Effects of rotation and ion incidence angle on sputter depth resolution in thin films of NiFe/Ta-Reference-Cited by-同舟云学术

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Effects of rotation and ion incidence angle on sputter depth resolution in thin films of NiFe/Ta

Published:1992-06 Issue:1-12 Volume:19 Page:55-59
ISSN:0142-2421
Container-title:Surface and Interface Analysis
language:en
Short-container-title:Surf. Interface Anal.

Author:

Henneberg Matthias M.,Pocker Daryl J.,Parker Michael A.

Publisher

Wiley

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference11 articles.

1. Quantitative depth profiling in surface analysis: A review

2. The depth dependence of the depth resolution in composition-depth profiling with Auger Electron Spectroscopy

3. in Practical Surface Analysis by Auger and X-ray Photoelectron Spectroscopy, edited by and Chapt. 4, pp. 141-179, Wiley, Chichester (1983).

4. Auger electron spectroscopy depth profiling during sample rotation

5. Sputtering in the surface analysis of solids: A discussion of some problems

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1. Fabrication of Bevel Structures by Means of the Spatial Gradient of Ion Dose in Ar Gas Cluster Ion Beam and Its Unique Characteristics;Advanced Materials Interfaces;2018-10-11

2. In situion beam sputter deposition and X-ray photoelectron spectroscopy (XPS) of multiple thin layers under computer control for combinatorial materials synthesis;Surface and Interface Analysis;2016-05-26

3. Quantitative Compositional Depth Profiling;Springer Series in Surface Sciences;2012-06-01

4. Quantitative surface analysis by Auger and x-ray photoelectron spectroscopy;Progress in Surface Science;1996-08

5. The influence of Ar+ and Xe+ ion beam incidence angle on the depth resolution in AES;Vacuum;1995-01

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