Surface and in-depth chemical characterization of sputter-deposited CrSiO layers by XPS and AES techniques

Author:

Bertóti I.,Tóth A.,Czermann M.,Menyhárd M.,Sulyok A.,Zsoldos E.

Publisher

Wiley

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Design of Cu-based intermetallic nanocrystals for enhancing hydrogenation selectivity;Chemical Engineering Science;2019-03

2. Modification effect of poly(vinylpyrrolidone) on surface structures of RhPt bimetallic nanocluster catalysts;Colloids and Surfaces A: Physicochemical and Engineering Aspects;2013-07

3. Nanoscale in-depth modification of CrOSi layers;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1997-02

4. He+ and Ar+ bombardment induced chemical changes in CrOSi layers;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1996-08

5. Effect of ion bombardment on CrSiO layers: an X-ray photoelectron spectroscopic study;Thin Solid Films;1994-04

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