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Effect of ion bombardment on CrSiO layers: an X-ray photoelectron spectroscopic study

  • Published:1994-04 Issue:1-2 Volume:241 Page:211-217
  • ISSN:0040-6090
  • Container-title:Thin Solid Films
  • language:en
  • Short-container-title:Thin Solid Films

Author:

Bertóti I.,Tóth A.,Mohai M.,Kelly R.,Marletta G.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Cited by 6 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. XPS MultiQuant: multimodel XPS quantification software;Surface and Interface Analysis;2004-08

2. Trends in sputtering;Progress in Surface Science;2000-05

3. X-ray photoelectron spectroscopy study of bombardment-induced compositional changes in ZrO2, SiO2, and ZrSiO4;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1999-09

4. Nanoscale in-depth modification of CrOSi layers;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1997-02

5. X-ray Photoelectron Spectroscopic and Atomic Force Microscopic Studies of Pyrolytically Coated Graphite and Highly Oriented Pyrolytic Graphite Used for Electrothermal Vaporization;J. Anal. At. Spectrom.;1997
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