Radial distribution of C 4 H 8 –H 2 –TMS plasma during plasma‐enhanced chemical vapor deposition of Si‐doped glow discharge polymers
Author:
Affiliation:
1. Laser Fusion Research CenterChina Academy of Engineering PhysicsMianyang China
2. Sichuan Co‐Innovation Center for New Energetic MaterialSouthwest University of Science and TechnologyMianyang China
Funder
National Natural Science Foundation of China
Publisher
Wiley
Subject
Polymers and Plastics,Condensed Matter Physics
Link
https://onlinelibrary.wiley.com/doi/pdf/10.1002/ppap.201900075
Reference33 articles.
1. Properties of Silicon-Doped GDP Shells Used for Cryogenic Implosions at OMEGA
2. Deposition of silicon-containing diamond-like carbon films by plasma-enhanced chemical vapour deposition
3. Deposition of silicon-doped diamond-like carbon films by plasma-enhanced chemical vapor deposition using an intermittent supply of organosilane
4. Physicochemical structure of SiCx:H to improve DLC adhesion on steel
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