Nitrogen Radical and Plasma Diagnostics in Dual Frequency Hybrid Plasmas to Investigate N2 /SiH4 PECVD Process-Reference-Cited by-同舟云学术

Nitrogen Radical and Plasma Diagnostics in Dual Frequency Hybrid Plasmas to Investigate N2 /SiH4 PECVD Process

Published:2015-07-31 Issue:4 Volume:13 Page:447-458
ISSN:1612-8850
Container-title:Plasma Processes and Polymers
language:en
Short-container-title:Plasma Process. Polym.

Author:

Sahu Bibhuti Bhusan¹,Han Jeon Geon¹,Shin Kyung Sik¹,Hori Masaru²

Affiliation:

1. Department of Advanced Materials Science and Engineering, NU-SKKU Joint Institute for Plasma Nano Materials (IPNM); Center for Advanced Plasma Surface Technology (CAPST), Sungkyunkwan University; Suwon 440-746 South Korea

2. Plasma Nanotechnology Research Center; Nagoya University; Furo-cho Chikusa-ku 464-8603 Japan

Funder

Ministry of Science, ICT, and Future Planning

Publisher

Wiley

Subject

Polymers and Plastics,Condensed Matter Physics

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/ppap.201500116/fullpdf

Reference60 articles.

1. PECVD silicon nitrides with low hydrogen content

2. Low temperature deposition of low stress silicon nitride by reactive magnetron sputtering

3. Effect of Incorporated Nitrogen on the Band Alignment of Ultrathin Silicon-oxynitride Films as a Function of the Plasma Nitridation Conditions

4. Utility of dual frequency hybrid source for plasma and radical generation in plasma enhanced chemical vapor deposition process

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