Study of Plasma Properties for the Low-Temperature Deposition of Highly Conductive Aluminum Doped ZnO Film Using ICP Assisted DC Magnetron Sputtering-Reference-Cited by-同舟云学术

Study of Plasma Properties for the Low-Temperature Deposition of Highly Conductive Aluminum Doped ZnO Film Using ICP Assisted DC Magnetron Sputtering

Published:2015-08-06 Issue:1 Volume:13 Page:134-146
ISSN:1612-8850
Container-title:Plasma Processes and Polymers
language:en
Short-container-title:Plasma Process. Polym.

Author:

Sahu Bibhuti Bhusan¹,Han Jeon Geon¹,Kim Jay Bum¹,Kumar Manish¹,Jin Subong¹,Hori Masaru²

Affiliation:

1. NU-SKKU Joint Institute Plasma-Nano Materials, Center for Advance Plasma Surface Technology (CAPST); Sungkyunkwan University; Suwon 440746 South Korea

2. Plasma nanotechnology research center; Nagoya University; Furo-cho Chikusa-ku-464-8603 Japan

Funder

National Research Foundation of Korea

Ministry of Science, ICT, and Future Planning

Publisher

Wiley

Subject

Polymers and Plastics,Condensed Matter Physics

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/ppap.201500094/fullpdf

Reference78 articles.

1. Synthesis and characterization of dye-sensitized solar cell using photoanode of TiO2 nanoparticles/Ti-mesh electrode

2. Micro/nanomechanical properties of aluminum-doped zinc oxide films prepared by radio frequency magnetron sputtering

3. The effect of front ZnO:Al surface texture and optical transparency on efficient light trapping in silicon thin-film solar cells

4. Past achievements and future challenges in the development of optically transparent electrodes

5. Effect of RF power on optical and electrical properties of ZnO thin film by magnetron sputtering

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