On the Deposition Rates of Magnetron Sputtered Thin Films at Oblique Angles-Reference-Cited by-同舟云学术

On the Deposition Rates of Magnetron Sputtered Thin Films at Oblique Angles

Published:2014-04-17 Issue:6 Volume:11 Page:571-576
ISSN:1612-8850
Container-title:Plasma Processes and Polymers
language:en
Short-container-title:Plasma Process. Polym.

Author:

Alvarez Rafael¹,Garcia-Martin Jose M.²,Lopez-Santos Maria C.¹,Rico Victor¹,Ferrer Francisco J.³,Cotrino Jose¹⁴,Gonzalez-Elipe Agustin R.¹,Palmero Alberto¹

Affiliation:

1. Instituto de Ciencia de Materiales de Sevilla (CSIC-Universidad de Sevilla); c/ Americo Vespucio 49 41092 Seville Spain

2. IMM-Instituto de Microelectrónica de Madrid (CNM-CSIC); Isaac Newton 8 PTM E-28760 Tres Cantos Madrid Spain

3. Centro Nacional de Aceleradores, Universidad de Sevilla-CSIC-Junta de Andalucía; Thomas A. Edison 7 E-41092 Sevilla Spain

4. Departamento de Física Atómica, Molecular y Nuclear; Universidad de Sevilla; Avenida Reina Mercedes s/n E-41071 Seville Spain

Funder

Junta de Andaluci'a

Spanish MINECO

Publisher

Wiley

Subject

Polymers and Plastics,Condensed Matter Physics

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/ppap.201300201/fullpdf

Reference33 articles.

1. Recent developments in plasma assisted physical vapour deposition

2. Reactive magnetron sputtering of transparent conductive oxide thin films: Role of energetic particle (ion) bombardment

3. Recent aspects concerning DC reactive magnetron sputtering of thin films: a review

4. Magnetron sputtering: a review of recent developments and applications

5. Branched Ta nanocolumns grown by glancing angle deposition

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